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filingDate 2013-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104505333-B
titleOfInvention Deposit Removing Method And Gas Processing Apparatus
abstract A deposit removing method includes an exposing process of heating and exposing a substrate to oxygen plasma; and a cycle process in which the substrate is exposed to an atmosphere of a mixture gas of a hydrogen fluoride gas and an alcohol gas, and a first period during which a total pressure of the mixture gas or a partial pressure of the alcohol gas is set to be a first total pressure or a first partial pressure and a second period during which the total pressure or the partial pressure is set to be a second total pressure lower than the first total pressure or a second partial pressure lower than the first partial pressure are repeated multiple cycles. A supply amount of the mixture gas from a first region including a central portion of the substrate is larger than that from a second region outside the first region.
priorityDate 2012-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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