http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104387512-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_989ed5137dd4fb46f2ee217791d052f5 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2014-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd1fed657d6ca6a1d3e0e44d26b4a8ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f521433d1a56c37e02927255da79adea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_901465a6dd1f5818ac6392212556e235 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf1dd377f36cf2f3fe19164fbf27d389 |
| publicationDate | 2015-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104387512-A |
| titleOfInvention | Sesquiterpene-containing film forming resin and negative 248nm photoresist thereof |
| abstract | The invention discloses sesquiterpene-containing film forming resin and a negative 248nm photoresist exposed at a deep ultraviolet (DUV) wave band of the sesquiterpene-containing film forming resin. The sesquiterpene-containing film forming resin is prepared by a copolymerization reaction of a comonomer in a solvent in the presence of a radical initiator. The molecular weight of the film forming resin is 2,000 to 1,000,000; the comonomer is a compound mainly comprising the following components in percentage by mass: 40-90 percent of substituted styrene, 5-60 percent of ingredients of a natural product sesquiterpene and 1-20 percent of few other performance regulating ingredients. The substituted styrene is at least one compound satisfying the chemical formula (I) in the specification; the sesquiterpene-containing unit is at least one sesquiterpineol (methyl) acrylate type compound satisfying the chemical formula (II) in the specification. The KrF negative photoresist disclosed by the invention is good in resolution rate, the adhesiveness and etching resistance of the photoresist and a silicon wafer can be improved as well, and processing properties are improved. |
| priorityDate | 2014-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 168.