| abstract |
This laminate is composed of a base (A), a silicon-containing layer (B) and a polymer layer (C) that is obtained from an organic acid metal salt having a polymerizable group, said silicon-containing layer (B) and polymer layer (C) being sequentially formed on at least one surface of the base (A). The silicon-containing layer (B) has a high nitrogen concentration region that is formed of: silicon atoms and nitrogen atoms; silicon atoms, nitrogen atoms and oxygen atoms; or silicon atoms, nitrogen atoms, oxygen atoms and carbon atoms. This high nitrogen concentration region is formed by modifying at least a part of a polysilazane film that is formed on the base (A) by irradiating the polysilazane film with an energy ray at an oxygen concentration of 5% or less and/or at a relative humidity of 30% or less at a room temperature of 23 DEG C. |