http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104364713-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2013-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104364713-B |
| titleOfInvention | Pattern and product are formed using block copolymer |
| abstract | Provide it is a kind of for making the method for layered structure pattern, this method comprises: execute photoetching to provide the pre- pattern layer of development on the horizontal surface of underlying substrate；Change pre- pattern layer to form inorganic material guiding thing spaced apart；Self-assembled block copolymers layer is cast and annealed to form spaced beam like features object；Pattern is formed by a kind of at least part of block of selective removal self-assembled block copolymers；And transfer pattern to underlying substrate.This method is suitable for manufacturing the patterning layered structure lower than 50nm. |
| priorityDate | 2012-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.