http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104350420-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-48721 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00087 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-487 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2013-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104350420-B |
| titleOfInvention | For handling the manufacturing method of monomolecular equipment |
| abstract | The present invention relates to a kind of methods for manufacturing for handling monomolecular equipment.According to the method, self assembly resist (155) is deposited on process layer (110, PL), and it is allowed to be self-assembled into the pattern with two-phase (155a, 155b).Then one (155a) in the two phases is selectively removed, and at least one hole is generated in process layer (110, PL) by the exposure mask of remaining resist (155b).Therefore, the hole of small size can be readily produced, which allows to handle unimolecule (M), such as handles in DNA sequencing. |
| priorityDate | 2012-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.