| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-104334674-B |
| titleOfInvention |
Comprise CMP composition and the using method of zirconia particles |
| abstract |
The present invention provides the chemical-mechanical polishing composition containing zirconia particles, being attached to the modifying agent of described zirconia particles, organic acid and water, and the method using such polishing composition polishing base material, and use the polishing composition polishing comprising zirconia particles, organic acid, oxidant and water containing metal and the method for the base material of dielectric material based on oxide. |
| priorityDate |
2012-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |