http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104332261-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_50271478c1dc3d7e530c363d156c36be |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01C17-12 |
| filingDate | 2014-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9cf437c091438ee5744c86e725afdf5 |
| publicationDate | 2015-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104332261-A |
| titleOfInvention | Preparation method of Pt film thermistor |
| abstract | The invention relates to a preparation method of a Pt film thermistor, which belongs to the preparation field of an electronic component. The method comprises the following steps: processing a substrate, washing by purified water, cleaning the surface of the substrate by gauze, immersing under room temperature by a chromic acid lotion, flushing by purified water, washing by alcohol and acetone, using carbon tetrachloride, acetone and alcohol for twice ultrasonic cleaning for 10 minutes; employing a sputtering plated film mode for processing plated film on the substrate, and arranging an elongated stripe broken line on the film. Through the improvement on the technology, the adhesive force of the film and the substrate is enhanced by employing the sputtering plated film mode, the film purity is high, repeatability is good, film forming rate is high, and the film can be prepared under low temperature. The Pt film thermistor preparation method has the advantages of simple operation and easy popularization. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107748299-A |
| priorityDate | 2014-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.