http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104330956-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2014-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104330956-B |
| titleOfInvention | The method of photoresist composition, the base material of coating and formation electronic device |
| abstract | The method of photoresist composition, the base material of coating and formation electronic device.A kind of photo-corrosion-resisting agent composition is provided, includes the polymer of the repeat unit with following structure.In addition to the polymer, photo-corrosion-resisting agent composition includes the photoactive component selected from photo-acid agent, photoproduction alkaline agent, light trigger and combinations thereof. |
| priorityDate | 2013-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 173.