| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-839
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-891
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-152
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31931
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31504 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C43-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2013-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-104321700-B |
| titleOfInvention |
The domain orientation in Block Copolymer Thin Film is controlled using chemical vapor deposition films |
| abstract |
The present invention uses vacuum-deposited material film, forms the not same area with following Block Copolymer Thin Film without the interface preferentially to interact.No preferential interface prevents from forming wettable layer and influences the domain orientation in block copolymer.The purpose of the polymer of deposition is that the nano structure that may act as Lithographic pattern is generated in Block Copolymer Thin Film. |
| priorityDate |
2012-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |