http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104319259-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76825 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate | 2014-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104319259-B |
| titleOfInvention | A kind of production method of super low dielectric constant film |
| abstract | The invention discloses a kind of production methods of super low dielectric constant film, it is performed etching by the low dielectric constant films first formed to deposition, (dielectric film porosity at this time is lower for graphic structure needed for being formed, the high stress for having enough mechanical strengths that hard exposure mask is supported to introduce), then carbon injection and ultraviolet irradiation are carried out again, to restore the aperture and porosity in dielectric film, it is further formed super low dielectric constant film, both the phenomenon that being avoided that dielectric film line falling, the effective dielectric constant (K value) of dielectric film can be made to keep minimum again, and it can be mutually compatible with existing industrial process. |
| priorityDate | 2014-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.