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filingDate 2013-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104285284-B
titleOfInvention Composition for polishing and Ginding process and the manufacture method of substrate using it
abstract The composition for polishing of the present invention contains water-soluble polymer and abrasive particle.Water-soluble polymer is the compound of the anionic property with less than 3 acid dissociation constant pKa.As the specific example of such compound, it can include:Polyvinylsulfonic acid, polystyrolsulfon acid, polyallyl sulfonic acid, polyacrylic acid ethylsulfonic acid, polyacrylic acid butyl sulfonic acid, poly- (methyl propane sulfonic acid of 2 acrylamide 2), polyisoprene sulfonic acid.Abrasive particle is in pH3.5 negative Zeta potentials shown below.As the specific example of such abrasive particle, cataloid can be included.
priorityDate 2012-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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