http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104254807-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2013-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104254807-B |
| titleOfInvention | Negative photosensitive silicone composition |
| abstract | The present invention provides a negative-type photosensitive siloxane compound capable of inorganic development, and a method for forming a cured film using the same. A negative photosensitive siloxane composition comprising polysiloxane, a silicon-containing compound having a ureido bond, a polymerization initiator, and a solvent. A cured film can be obtained by apply|coating this composition on a base material, exposing, and developing without heating after exposure. |
| priorityDate | 2012-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 238.