http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104246610-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2013-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104246610-B |
| titleOfInvention | Photocurable composition |
| abstract | The present invention is described comprising organosilicon-polyether block copolymer low-surface-energy photo-corrosion-resisting agent composition, wherein the organic block includes the copolymer of 35 weight % or more.When with photo-corrosion-resisting agent composition chemical combination, the composition allows photomask to discharge from the photoresist layer. |
| priorityDate | 2012-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 195.