Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1157 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-125 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-143 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-097 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-09 |
filingDate |
2013-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2017-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-104185880-B |
titleOfInvention |
Liquid composition, copper metal film, conductive wiring line, and method for producing copper metal film |
abstract |
Provided is a copper metal film which has less voids and good electrical conductivity, while exhibiting good adhesion to a base. A liquid composition which contains (a) at least one substance that is selected from the group consisting of formic acid and copper formate, (b) copper oxide particles and (c) a solvent. |
priorityDate |
2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |