http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104101950-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-136 |
| filingDate | 2014-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104101950-B |
| titleOfInvention | A kind of preparation method of planar optical waveguide |
| abstract | The invention discloses a kind of preparation method of planar optical waveguide, including：In substrate surface formation sandwich layer；In core layer surface formation metal level；In layer on surface of metal formation photoresist layer, and pattern the photoresist layer；The substrate level is placed in etching groove, the metal level is performed etching by mask of the photoresist layer after patterning, wherein, the substrate is provided with the surface of the metal level and placed upward, and the metal level is immersed in the metal etch reagent in the etching groove；Judge whether the etching of the metal level is completed, after the completion of the etching, remove the photoresist layer after patterning, the sandwich layer is performed etching by mask of the metal level after etching, pattern the sandwich layer, form the waveguide core layer of preset structure；The metal level after etching is removed, protective layer is formed on the waveguide core layer surface.The preparation method reduces the cost of manufacture of planar optical waveguide. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110488416-A |
| priorityDate | 2014-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.