http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104035276-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate | 2007-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104035276-B |
| titleOfInvention | method and apparatus for photomask plasma etching |
| abstract | The present invention provides a kind of method and apparatus for etching photomask.The device is included in the processing chamber above substrate support with backplate.The backplate includes region there are two plate with hole and plate tools, the two regions have at least one attribute different from each other, such as material or potential bias.This method is provided for etching the photomask substrate with ion and neutral substance distribution by backplate. |
| priorityDate | 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.