| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-2612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2012-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-104024940-B |
| titleOfInvention |
Monomer for hard mask compositions, the hard mask compositions comprising the monomer and the method that pattern is formed using the hard mask compositions |
| abstract |
The present invention relates to a kind of monomer for hard mask compositions represented by formula 1, the hard mask compositions comprising the monomer and the method for forming pattern using the hard mask compositions. |
| priorityDate |
2011-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |