http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104004987-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B34-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C10-30 |
| filingDate | 2014-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104004987-B |
| titleOfInvention | The titanizing method of titanium sponge production reactor |
| abstract | The invention belongs to non-ferrous metal chemical industry field of smelting, it is specifically related to the titanizing method of a kind of titanium sponge production reactor. Technical problem to be solved by this invention is to provide the titanizing method of the titanium sponge production reactor of a kind of shorter, better effects if consuming time. The titanium sponge production of the present invention titanizing method of reactor first, comprises the steps: a, new reactor hot acid leaching 1-3 days, then washing and drying; B, smear useless titanium at inner wall of new reactor by inner wall surface area 30��80g/; C, in new reactor, add appropriate titanium tetrachloride and magnesium, it is warming up to 800��950 DEG C and oozes titanium; Wherein, the add-on of magnesium and titanium tetrachloride is so that titanium layer is oozed in the titanium and the formation of new reaction wall that generate. Titanizing method of the present invention to ooze titanium effect better, in the titanium sponge that the reactor after oozing titanium is produced, impurity obtains much slower; Avoid high temperature to ooze titanium new reactor is formed infringement, it is to increase ooze work-ing life of the reactor after titanium. |
| priorityDate | 2014-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.