| abstract |
An object of the present invention is to provide a passivation film that simultaneously realizes electrical insulating properties, heat resistance, solvent resistance, and dry etch-back properties. As means for solving the problem of the present invention, it relates to a composition for forming a passivation film, which has the following formula (i): (wherein, T 0 represents a sulfonyl group, a fluoroalkylene group, a cyclic alkylene group, A polymer having a unit structure of a substituted arylene group, or a combination of a substituted arylene group and a fluoroalkylene group or a cyclic alkylene group.), at the terminal, side chain, Or the main chain has at least one group having the structure of formula (2-A), formula (2-B) or both. The polymer may have a unit structure of the following formula (1). AA style. |