http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103922268-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B7-00 |
| filingDate | 2014-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103922268-B |
| titleOfInvention | Ladder beam type high q-factor overload-resistant MEMS suspension inductance |
| abstract | The invention discloses a kind of ladder beam type high q-factor overload-resistant MEMS suspension inductance.Inductance is made up of ladder beam type suspension spiral coil, electrical connection column and lead-in wire, by the anti-overloading performance adopting staged winding wire to improve MEMS suspension inductance.Manufacture craft is: cleaning substrate; Substrate back sputtering Cr, resist coating, after graphical, etching makes alignment mark; Substrate front sputtering Cr/Cu Seed Layer; Substrate front resist coating, electroforming lead-in wire after graphical; Substrate front resist coating, electroforming column after graphical; Substrate front resist coating, electroforming ground floor coil after graphical; Substrate front resist coating, electroforming second layer coil after graphical; Substrate front resist coating, electroforming third layer coil after graphical; Remove photoresist and Seed Layer.The MEMS suspension inductance that the present invention proposes has excellent radio-frequency performance and stronger anti-overload ability, and manufacture craft is succinct, and yield rate is high. |
| priorityDate | 2014-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.