http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103907058-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2012-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37c55c48d1cf96bcf26cf36f7af42a0e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f47ece7492660304240f3aa2173e509d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1711511f131bc77a65facbc3b197a2d2 |
| publicationDate | 2014-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103907058-A |
| titleOfInvention | Nanocomposite positive photosensitive composition and use thereof |
| abstract | The present invention relates to a positive photosensitive composition suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film formed from the composition is preferably less than 5 microns. The positive photoresist composition can be selected from (1 ) a composition comprising (i) a film-forming resin having acid labile groups, and (ii) a photoacid generator, or (2) a composition comprising (i) a film-forming novolak resin, and (ii) a photoactive compound, or (3) a composition comprising (i) a film- forming resin, (ii) a photoacid generator, and (iii) a dissolution inhibitor.; The invention also relates to a process of forming an image using the novel photosensitive composition. |
| priorityDate | 2011-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 173.