http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103898010-B

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filingDate 2014-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-103898010-B
titleOfInvention One plant height tolerance Bai Shi clostridium and application thereof
abstract Do you the invention discloses a plant height tolerance Bai Shi clostridium <i>Clostridium? beijerinckii? </i>M17<bGreatT. GreaT.GT? CCTCC? NO</b><bGreatT.G reaT.GT:</b><bGr eatT.GreaT.GTM? 2013425</b> and the application in production butanols thereof.This bacterial strain is obtained by normal-temperature plasma mutagenesis and screening, to the toxic substance in non-detoxification wood fibre acidolysis liquid glucose, there is high resistance, in phenol concentration up in the fermented liquid of 2.0g/L, can very well fermentative production butanols, its total solvent output and butanols output reach 10.9g/L and 7.9g/L respectively, even if phenol concentration is up to 2.4g/L, bacterial strain of the present invention still has considerable product butanols ability, illustrate that bacterial strain Bai Shi clostridium M17 of the present invention not only has efficiency utilization rate to bagasse acidolysis liquid glucose, and to toxin inhibition wherein, especially phenolic compound has high resistance, a kind of being applicable to utilize bagasse fermentation to produce the excellent species of butanols.
priorityDate 2014-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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