http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103866230-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e838e20dcd49904fcd1b5d3a5732c7ca |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 |
| filingDate | 2014-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12574e609f63704958d24ffc9ead0bcb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_adf1751a5c2f3eeb31872ac4d6d39c3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a96d95b08702162aa476e53b8adc65a |
| publicationDate | 2014-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103866230-A |
| titleOfInvention | Manufacturing method for novel shadow mask for producing OLED display panel |
| abstract | The invention discloses a manufacturing method for a novel shadow mask for producing an OLED display panel. The manufacturing method comprises the steps of preparing a substrate or a framework workpiece, processing an alignment marker, embedding a filler, coating a photosensitive layer, performing exposure, development and plasma activation treatment, protecting a non-electric depositional surface, electrically depositing a fine mask, removing the photosensitive layer, removing the filler and the like. The filler is very convenient to remove and etch; in an etching process, a protection layer does not need to be added, and the filler etching work can be finished within 2-3 hours, so that the etching period is greatly shortened, and the production cost of a product is lowered. According to the shadow mask manufactured by the method disclosed by the invention, the fine mask and the substrate or the framework are tightly combined to form an integrated structure; on one hand, the process for welding the fine mask on a border is canceled, and the manufacturing process is simplified; on the other hand, an inner separation frame on the substrate or the framework can achieve a certain supporting and protecting effect in a corresponding operation process for cleaning and OLED evaporation, so that drop-down of the fine mask is alleviated, and the service life of the shadow mask is greatly prolonged. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I656635-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10996555-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11038009-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10627714-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105887010-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105887010-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018188566-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115074664-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108728789-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108728789-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019210618-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017193995-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109825798-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108735915-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106637072-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108735915-B |
| priorityDate | 2014-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.