http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103849844-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 |
| filingDate | 2014-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103849844-B |
| titleOfInvention | For the fluorine doped tin oxide target and preparation method thereof of magnetron sputtering |
| abstract | The invention provides a kind of fluorine doped tin oxide target for magnetron sputtering and preparation method thereof, preparation method for the fluorine doped tin oxide target of magnetron sputtering comprises the following steps: under hot conditions, mix after respectively tin compound being gasified with fluorine cpd, and by carrier gas, this mixed gas is brought in high-temperature reactor, generate FTO crystallization or powder at reactor wall or bottom; This FTO crystallization or powder are carried out grind, compressing tablet, obtain the fluorine doped tin oxide target for magnetron sputtering.The preparation method that the present invention is used for the fluorine doped tin oxide target of magnetron sputtering is simple, easy, the suitability for industrialized production of the fluorine doped tin oxide target being used for magnetron sputtering can be realized, the FTO conductive glass good conductivity that the fluorine doped tin oxide target prepared by the method is produced, light transmission is good, be combined firmly with substrate, coatings is fine and close, even. |
| priorityDate | 2014-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.