http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103839785-B
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0198 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2207-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2203-0353 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B7-0006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66803 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
filingDate | 2013-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2016-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2016-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-103839785-B |
titleOfInvention | The method forming picture construction |
abstract | The method that the present invention relates to form picture construction.After forming template layer on neutral polymer layer, self-assembled block copolymers material is applied in and self assembly.This template layer includes the first linear parts, second linear parts shorter than described first linear parts and has the block formwork structure of the width bigger than described second linear parts.In the region away from the part extended in the direction of the width, this self-assembled block copolymers material is separated into alternating thin layers.Described block formwork structure is upset described thin layer and causes the termination of described thin layer.When polymeric block component is selectively removed, formed parallel with described first and second linear parts and with the chamber that terminates, block formwork structure autoregistration ground.The figure in described chamber can be inverted and transfer in material layer to form the fin with different length. |
priorityDate | 2012-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.