http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103814432-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4908 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 |
| filingDate | 2012-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103814432-B |
| titleOfInvention | Increase the engraving method of copper/molybdenum alloy film of etching solution etching consumption |
| abstract | The present invention relates to a kind of increase method of etching consumption of copper/molybdenum alloy film of manufacturing for TFT-LCD etching solution, according to method of the present invention, in the time using copper/molybdenum alloy film to carry out etching repeatedly with etching solution, can make the low etching characteristics such as its etching speed occurring, tapering curve, etching linearity be recovered, and can increase the etching consumption of etching solution, thereby can reduce significantly the manufacturing expense of TFT-LCD etc. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110230059-A |
| priorityDate | 2011-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.