http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103803715-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_778fe5aa551806ca134b210927ef0eb8 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F5-08 |
| filingDate | 2012-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35f49899266748ea9eecd04ea75b5b54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96c2a9e7c02d6e6d81c265b5b5e7ba46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf881e47e13cf74f13da8db7fa05d0a4 |
| publicationDate | 2014-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103803715-A |
| titleOfInvention | Method used for processing waste liquid of copper/copper barrier layer polishing solution |
| abstract | The invention discloses a method used for processing waste liquid of a copper/copper barrier layer polishing solution. According to the method, a chemical solution containing an oxidizing agent is used for removing gel and copper ions in the waste liquid of the copper/copper barrier layer chemical mechanical polishing solution. The method is capable of avoiding blocking of pipelines by the waste liquid of the copper/copper barrier layer chemical mechanical polishing solution, and reducing environmental pollution caused by copper ions. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112175525-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106794397-A |
| priorityDate | 2012-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 69.