http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103616795-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 |
| filingDate | 2013-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103616795-B |
| titleOfInvention | A kind of strong acid resistant photomask and preparation method thereof |
| abstract | The invention discloses a kind of strong acid resistant photomask and preparation method thereof.The strong acid resistant photomask includes：Glass substrate and setting chromium film layer on the glass substrate, wherein chromium film layer include being directed away from chromium carbonitride light-shielding film layer and the chromium nitrogen oxides antireflection film layer that glass substrate direction sets gradually.The preparation method includes obtaining glass substrate, forms chromium film layer on the glass substrate, wherein the step of forming chromium film layer includes：Chromium carbonitride light-shielding film layer is formed on the glass substrate；Chromium nitrogen oxides antireflection film layer is formed on chromium carbonitride light-shielding film layer.The photomask with double-decker chromium film layer of the present invention has good resistance to strong acid corrosivity, therefore strong acid can be adopted to clean the photomask that the present invention is provided, so which keeps clean state, and then ensures the reliability of storage information. |
| priorityDate | 2013-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.