http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103576458-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2013-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103576458-B |
| titleOfInvention | Photoetching compositions and the method for forming photoengraving pattern |
| abstract | Photoetching compositions and the method for forming photoengraving pattern.A kind of photoetching compositions, the photoetching compositions include：First polymer comprising acid-unstable group；Second polymer, the second polymer include：The first module formed by the first monomer of general formula (I), wherein：P is polymerizable functional group；R1 is selected from substitution and unsubstituted C1 C20 are linear, branched and cyclic hydrocarbon；Z is the spacer units selected from substitution with unsubstituted linear or branced aliphatic and aromatic hydrocarbon and combinations thereof, optionally has one or more attachment structure parts selected from O, S and COO；It is 05 integer with n；And the second unit formed by the second comonomer with basic moieties, wherein the first monomer and second comonomer differ；Wherein second polymer is without acid-unstable group and wherein second polymer has the surface energy lower than first polymer；Light acid producing agent；And solvent. |
| priorityDate | 2012-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 152.