| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F257-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2012-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d2053281d18e1d3792dc4ce24f93565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_664efdc9da602c2aed91744200c002ab |
| publicationDate |
2014-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-103534648-A |
| titleOfInvention |
Positive resist composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photomask |
| abstract |
A positive resist composition containing: (A) a polymer compound having a structure in which a hydrogen atom of a phenolic hydroxyl group is replaced by an acid-labile group represented by the following formula (I), wherein R represents a monovalent organic group; A represents a group having a polycyclic hydrocarbon ring structure or a group having a polycyclic heterocyclic structure; and * represents a bonding position to an oxygen atom of the phenolic hydroxyl group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105319852-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103608728-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105446084-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105446084-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103608728-A |
| priorityDate |
2011-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |