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filingDate 2013-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1583d587482d8a6c606a6d6bfdf1c8f5
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publicationDate 2014-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-103531625-A
titleOfInvention Nitride-based compound semiconductor device
abstract The invention provides a nitride-based compound semiconductor device in which with the low leakage current and the current collapse phenomenon are reduced can be achieved. The nitride-based compound semiconductor device includes a substrate, a first nitride-based compound semiconductor layer that is formed above the substrate with a buffer layer interposed between them, a second nitride-based compound semiconductor layer that is formed on the first nitride-based compound semiconductor layer and that has a larger band gap than a band gap of the first nitride-based compound semiconductor layer, and an electrode that is formed on the second nitride-based compound semiconductor layer. The second nitride-based compound semiconductor layer has a region in which carbon is doped near a surface of the second nitride-based compound semiconductor layer.
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