http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103424990-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-101 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2013-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103424990-B |
| titleOfInvention | Photonasty polysiloxane, protecting film and there is the element of protecting film |
| abstract | The present invention relates to photonasty polysiloxane, protecting film and there is the element of protecting film.A kind of photonasty polysiloxane, comprises polysiloxane component (A), quinone two nitrine based compound (B), fluorine derivative component (C) and solvent (D).This polysiloxane component (A) includes at least one polysiloxanes macromolecule with at least one thiazolinyl.This fluorine derivative component (C) includes at least one fluorene derivative with at least one group containing double bond.The protecting film formed by this photonasty polysiloxane has preferably chemical resistance and resistance to developability. |
| priorityDate | 2012-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 403.