http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103352201-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2007-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103352201-B |
| titleOfInvention | It is suitable for etching the vacuum processing chamber of high aspect ratio features |
| abstract | Embodiments of the present invention provide a kind of device being suitable for etching the such as treatment chamber of high aspect ratio features. In other embodiments, the different chamber component that can obtain excellent result during high aspect ratio etch is disclosed. Such as, in one embodiment, it is provided that treatment chamber, described treatment chamber comprises room main body, and described room main body has the nozzle component being arranged in the main body of room and substrate supports assembly. Nozzle component comprises at least two plenum chambers fluidly isolated, the regional transmission of energy transmission optical metrology signal, and through multiple gas passages that nozzle component is formed, plenum chamber is fluidly coupled to the internal capacity of room main body. In other embodiments, it provides at least one being of value in the novel cathode liner of plasma etching high aspect ratio features, top outer liner, bottom outer liner, substrate supports assembly, cap assemblies, nozzle component and quartz ring. |
| priorityDate | 2006-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.