http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103336412-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103336412-B |
| titleOfInvention | Novel photoresist stripper and application technology thereof |
| abstract | The invention relates to a novel photoresist stripper used for removing superfluous photoresist on a substrate. The stripper comprises an organic solvent used for dissolving, a crosslinking catalyst for accelerating glue removal rate and an anticorrosion protective agent for avoiding substrate corrosion. The photoresist stripper can shorten common glue removal period, has no toxicity to human body and the environment, and can thoroughly remove crosslinked photoresist after exposure especially negative photoresist, in order to prevent influence on subsequent usage performance. In addition, the invention also provides a technology process for utilization of the photoresist stripper. The process does not comprise heating or oscillation, thereby increasing glue removal speed and avoiding possible damage on the substrate caused by auxiliary measures. |
| priorityDate | 2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 89.