http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103311271-B

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
filingDate 2012-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-103311271-B
titleOfInvention Charge compensation semiconductor device
abstract The present invention relates to charge compensation semiconductor device. A kind of semiconductor device includes semiconductor body and the layout source metallization on the first surface with the first surface limiting vertical direction. In vertical cross section, semiconductor body farther includes: the drift region of the first conduction type; At least two compensatory zone of the second conduction type, each compensatory zone forms pn-junction with drift region and electrically connects with source metallization low-resistance; The drain region of the first conduction type, the maximum dopant concentration of drain region is higher than the maximum dopant concentration of drift region; And first the 3rd semiconductor layer of conduction type, be arranged between drift region and drain region and include floating field plate and formed with the 3rd semiconductor layer pn-junction the second conduction type floating semiconductor regions at least one.
priorityDate 2012-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 30.