http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103304521-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01f1be48d9b96a3bcc32fa862d9fad31 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D207-333 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-42 |
| filingDate | 2012-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9e94876652f4fc55ec60da7f47d98dc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d923e85b16f0ae2698d1a48d953b9570 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_398f8c22bdc50e66699bf0817cfb9521 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d42663971f93cb211a4302890b8ae59 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dd922d3ecd5c21bb638652598992728 |
| publicationDate | 2015-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103304521-B |
| titleOfInvention | Molecular Glass Photoresists with Tetraphenylfuran, Tetraphenylpyrrole, Tetraphenylthiophene and Pentaphenylpyridine as Cores |
| abstract | The present invention provides a molecular glass with tetraphenylfuran, tetraphenylpyrrole, tetraphenylthiophene and pentaphenylpyridine as the core of the general formula (I) or (II), and an optical glass with the above-mentioned molecular glass as a matrix component. A resist composition, which includes: one or more matrix components selected from the general formula (I) or (II), a photoacid generator, an organic base and an organic solvent. The photoresist composition of the present invention is a chemically amplified positive photoresist, which is suitable for exposing under extreme ultraviolet (13.5nm) and electron beams, and developing in an alkaline developing solution. The film prepared by the photoresist composition of the invention has good resolution, photosensitivity, adhesion and is easy to preserve. |
| priorityDate | 2012-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.