http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103277409-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16C32-0472 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F16C32-04 |
| filingDate | 2013-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103277409-B |
| titleOfInvention | Five-freedom degree magnetic levitation guide rail with electromagnet distribution |
| abstract | The invention discloses a five-freedom degree magnetic levitation guide rail with novel electromagnet distribution, which comprises a guide rail, a levitation platform, a plurality of electromagnets equipped on the levitation platform and a air gap detection displacement sensor group for detecting motion state on each direction of the levitation platform. A plurality of electromagnets are oppositely arranged on the levitation platform in pair, and excitation of each group of electromagnet pair is set with a differential control mode for providing stable levitation force and guidance force. The plane where the work magnetic circuit of each electromagnet is located is parallel to the operation direction of the levitation platform; the winding current directions of the three electromagnets located at one corner of the levitation platform are identical. The electromagnetic attraction produced by the electromagnet according to the invention can realize five-freedom degree levitation of the levitation platform, thereby solving the magnetic field coupling problem between electromagnets, and the levitation platform has the advantages of contactless, non-lubrication, long stroke, high precision, high speed and adjustable static state rigidity, etc., and the product is suitable for the linear feeding equipment such as high-grade numerical control machine tool and mask aligner or the like which need ultra-clean, high precision and other performances. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020214025-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/NL-2022986-B1 |
| priorityDate | 2013-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.