http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103257534-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81ca9a5f1da06521982d5a6b55b04244 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate | 2013-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6462ed25f469a1096606b411572d89e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_083e559db531e343628fe837b2abfee3 |
| publicationDate | 2015-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103257534-B |
| titleOfInvention | Photoetching rework photoresist removing technology |
| abstract | The invention discloses a photoetching rework photoresist removing technology which comprises the steps of: providing a wafer to be treated by photoetching rework; photoetching the surface of the wafer for a first time to produce residual photoresist; using a photoetching machine which can generate a light beam capable of enabling the photoresist to be in complete photochemical reaction to expose the surface of the whole wafer; and developing the surface of the exposed wafer, and removing the photoresist. According to the technology, plasma dry ashing does not need to be utilized, high-temperature manufacture procedure does not exist, and chemical liquid with strong oxidizing property or acidity is not needed, so that a film on the surface of the wafer is not damaged or modified. The technology is simple and less in material consumption, improves the stability and the manufacturing performance of the whole manufacturing process flow, and adds the limitation for the maximum photoetching rework times, thus providing high technical fault tolerance for research, development and mass production. |
| priorityDate | 2013-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.