http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103247504-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-147 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-20 |
| filingDate | 2013-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103247504-B |
| titleOfInvention | A kind of Dual-frequency ion source |
| abstract | The invention discloses a kind of Dual-frequency ion source, comprise backboard, arc chamber, grid and averager, the rear end of described arc chamber is hidden by backboard to be closed, and backboard is provided with air inlet, grid is arranged on arc chamber front end, and averager is arranged on grid plasma emission mouth place; Described arc chamber is drum type brake and is divided into two sections, and leading portion is reduced diameter section, and back segment is enlarged diameter section, arranges two-stage radio-frequency induction coil two sections of arc chamber outer rims.The present invention normally can work under the low pressure of 0.001Pa, and make processing range during plated film wider, ionogenic stability is high, and in coating process, the error of line is within positive and negative 3%, 500 hours failsafes can be used continuously and ion beam pollute little. |
| priorityDate | 2013-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 15.