http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103233219-B

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d7e466c44c7b54e2a48e4bf62665ef
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C24-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-36
filingDate 2013-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2015-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a444adf21fa7809cbd5ffd197eb8bc35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d337dd4612aefed1bc894bc278580e00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_512f3b6786feda8c46fd6729d3423e07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc8f42614aad0d1fdc86973bc84f8738
publicationDate 2015-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-103233219-B
titleOfInvention Metal TiN ceramic coating preparation process method
abstract According to the invention, a high energy micro-arc alloying technology and a glow plasma nitriding technology are combined to prepare a TiN coating on the surface of a metal. The process method comprises: adopting a high energy micro-arc alloying technology to deposit a layer of a pure Ti coating on the surface of a metal, wherein pure Ti with a certain specification is selected as a deposition electrode during the preparation process, and a variable thickness of the pure titanium layer can be achieved through controlling key technology parameters in the preparation process; and carrying out a nitriding treatment on the deposited pure titanium layer through a glow plasma nitriding technology to form a TiN layer, wherein during the treatment process, a furnace is adopted as an anode, the titanium layer is adopted as a cathode, ammonia gas or mixed gas of hydrogen gas and nitrogen gas is introduced, and nitrogen ions and nitrogen atoms generated from glow discharge are easily absorbed and permeated by the micro-crystallized Ti layer so as to form the TiN coating on the surface of the micro-crystallized Ti layer.
priorityDate 2013-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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