http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103189457-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 2011-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2015-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2015-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-103189457-B |
titleOfInvention | For moisture polishing composition and the method for chemically machinery polished electronics, machinery and optics base material |
abstract | The present invention relates to a kind of moisture polishing composition, it comprises: (A) is dispersed in abrasive grain positively charged when pH is in the water-bearing media of 3-9 when it, and this is proved by electrophoretic mobility; (B) hydroxy-containing component of water-soluble and water dispersible, it is selected from: (b1) aliphatic series and cycloaliphatic hydroxyl group carboxylic acid, and wherein the molar ratio of hydroxyl and carboxylic acid group is at least 1; (b2) there is ester and the lactone of the hydroxycarboxylic acid (b1) of at least one hydroxyl; (b3) its mixture; And (C) is selected from following water-soluble and aqueous dispersion polymers component: the oxidized olefin polymer of (c1) linear and branching; (c2) aliphatic series of linear and branching and alicyclic ring adoption (N-vinylamide) polymkeric substance; (c3) weight-average molecular weight is less than 100,000 daltonian cationoid polymerisation flocculation agent; And a kind of method of polishing electronics, machinery and optics base material. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11773291-B2 |
priorityDate | 2010-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 231.