| abstract |
The present invention provides a silicon compound, a condensate, a resist composition using the same, and a pattern forming method using the same. The present invention provides a silicon compound that can be easily synthesized using a hydrolyzable silicon compound such as alkoxysilane as a raw material, has a hydrolyzable group such as an alkoxy group in the same molecule, and is dissociated by irradiation with high-energy rays And produce the photoacid generator group of acid. A kind of silicon compound, it is represented by general formula (1), and in formula (1), R 1 is respectively independently hydrogen atom, straight-chain hydrocarbon group with 1~20 carbon atoms, branched with 3~20 carbon atoms Chain or cyclic hydrocarbon group, the carbon atoms of the hydrocarbon group may be replaced by oxygen atoms, and may also contain fluorine atoms. A is an acid-decomposable group, B is a hydrolyzable group, n is an integer of 0-2, m is an integer of 1-3, and n+m is an integer of 1-3. R 1 n A m SiB 4-(n+m) (1). |