http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103043707-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_53b4d53983adbf56dd0e7d0bf96f8ce5 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G9-02 |
| filingDate | 2013-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea2bdeb888022bff3e6a20f778d92d42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a98ee77f205983aa27c804e1b3ba04e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ffc21043caf4eaf9e871abd0ffcaaeff |
| publicationDate | 2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-103043707-B |
| titleOfInvention | Preparation method of perpendicular array ZnO nanowire |
| abstract | The invention relates to a preparation method of a perpendicular array ZnO nanowire, belonging to the field of a nanowire preparation method. The method comprises the following processing steps: (1) precursor solution preparation: adding deionized water into a reaction vessel, then adding zinc salt and polyethyleneimine, and stirring at room temperature and normal pressure for 0.5-3 hours, thus obtaining the precursor solution; (2) ultrafiltration: performing ultrafiltration on the precursor solution; (3) spin coating: dropwisely adding the solution obtained through entrapping in the step (2) onto a substrate, and then coating rubber at a rotation speed of 500-3000 rpm; and (4) heat treatment: 1) keeping the rubber-coated substrate at 400-600 DEG C in a normal-pressure oxygen gas atmosphere for 30-120 minutes, and naturally cooling the substrate to room temperature after the expiration of the temperature keeping time; 2) keeping the substrate treated in the substep 1) at 800-1000 DEG C in a normal-pressure oxygen gas atmosphere for 1-10 minutes, and naturally cooling the substrate to room temperature after the expiration of the temperature keeping time; and 3) keeping the substrate treated in the substep 2) at 400-600 DEG C in a 100-3000 Pa oxygen gas atmosphere for 5-30 minutes. |
| priorityDate | 2013-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.