| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D277-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2012-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84d9f1f50907cdfea6c493745594712a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cd5f60d9758010664d79729f9f688b4 |
| publicationDate |
2013-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-103019034-A |
| titleOfInvention |
Positive photosensitive resin composition, cured film and method for producing same, pattern, method for producing MEMS structure, dry and wet etching method |
| abstract |
The invention provides a positive photosensitive resin composition, a cured film and a manufacturing method thereof, a pattern, a manufacturing method of a MEMS structure, and a dry and wet etching method. The positive photosensitive resin composition can form a rectangular or nearly rectangular outline even after the formed pattern is baked. The present invention uses a positive photosensitive acrylic resin, which contains a carboxyl group at the end of the main chain, and contains a repeating unit of a cyclic ether group with a 3-membered ring and/or a 4-membered ring. It is insoluble or hardly soluble in neutral developing solution, and becomes soluble in alkaline developing solution through the action of acid. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109415467-A |
| priorityDate |
2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |