http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102993000-B
Outgoing Links
Predicate | Object |
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classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C51-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C63-26 |
filingDate | 2012-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2015-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2015-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-102993000-B |
titleOfInvention | Poor oxygen gas is adopted to carry out method and the device of deep oxidation production PTA |
abstract | The present invention relates to a kind of method and the device that adopt Poor oxygen gas production PTA, said method comprising the steps of: (1) p-Xylol makes it be oxidized with oxygen-containing gas in solvent acetic acid, generate the oxidation slip containing terephthalic acid and intermediate product; (2) adopt the oxidation slip of Poor oxygen gas to step (1) to carry out deep oxidation and obtain PTA; Described device comprises oxidation reaction apparatus, deep oxidation reaction unit and device for purifying and treating tail gas, the material outlet of oxidation reaction apparatus connects the material inlet of deep oxidation reaction unit, the gas feed of deep oxidation reaction unit connects the pneumatic outlet of device for purifying and treating tail gas by exhaust pipe road, the gas feed of deep oxidation reaction unit is also connected with compressed air tunnel.The present invention adopts Poor oxygen gas to carry out deep oxidation can meet the demand of deep oxidation reaction to oxygen concn, can to avoid again in gas that oxygen level is too high causes acetic acid oxidizing fire, also can increase the gas holdup in reaction paste. |
priorityDate | 2012-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.