http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102955301-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133553 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2201-40 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1259 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13439 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-134363 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-77 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12 |
| filingDate | 2012-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-102955301-B |
| titleOfInvention | For array base palte and the manufacture method thereof of liquid crystal indicator |
| abstract | For the array base palte of liquid crystal indicator, comprising: intersected with each other with the grid line limiting pixel region and data line on substrate; Separate with grid line and parallel concentric line; Thin film transistor (TFT), is arranged in pixel region and is connected with data line with grid line; Passivation layer, is positioned on thin film transistor (TFT); And pixel electrode and public electrode, alternately arrange to produce plane electric fields, wherein pixel electrode and each of public electrode have double-decker, and namely lower floor is formed by reflective conductive material, and upper strata is formed by transparent conductive material.On the other hand, the manufacture method of array base palte, comprising: the reflective conductive layer forming the first thickness on substrate; At Hn 2 on reflective conductive material layer, the transparent conductive material layer of the second thickness is formed under O gas condition; Transparent conductive material layer forms photoetching agent pattern; And use photoetching agent pattern as etching mask etching transparent conductive material layer and reflective conductive material layer, thus form double-deck pixel electrode and public electrode. |
| priorityDate | 2011-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.