| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-73921
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2011-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C65-1635
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29D7-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-81267
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-1122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-8322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-43 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C55-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C69-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C65-16 |
| filingDate |
2012-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-102909862-B |
| titleOfInvention |
The manufacture method of polarizing film |
| abstract |
The present invention provides the manufacture method of polarizing film, and it has: stretch the 1st operation of multiple banding polyvinyl alcohol resin thin film successively；Overlap with the leading section of the terminal part of the first polyvinyl alcohol resin thin film that will get ahead and ensuing second polyvinyl alcohol resin thin film, the 2nd operation by welding, they engaged and connect, in aforementioned 2nd operation, engage so that the tensile stress when width along aforementioned polyvinyl alcohol resin thin film stretches junction surface with the stretching ratio of 4 times is less than more than 75% 105% relative to the tensile stress stretched during disengaged portion with aforementioned stretching ratio along foregoing width direction. |
| priorityDate |
2011-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |