http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102872654-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9de52bba13e16028dffa8775e3f3f28 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D39-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A41D13-11 |
filingDate | 2012-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2015-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed951f04854109ee75b4776abd6f22c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20f205a48aaa812bc44f9fd16f22ac63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d38e780a51753f134a4032cfb6631e05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7979be30256b5284917a139daa8e3c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82f398246716a73273a9497ef0868cd6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59404f79470caed961e554fe9fc01219 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e16a858064a36192678b90666a2785c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab6027a6193392d4e91042ff2d898c67 |
publicationDate | 2015-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-102872654-B |
titleOfInvention | Filtering material for mask and method for manufacturing filtering material |
abstract | The invention discloses a filtering material for a mask and a method for manufacturing the filtering material. The filtering material for the mask comprises polymeric nano-fibers and a supporting non-woven fabric. The method for manufacturing the filtering material includes spinning homogenous polymeric nano-fiber spinning solution or fusant on the supporting non-woven fabric by solution or fusion electrostatic spinning. The filtering material for the mask is excellent in breathability, and rejection to sodium chloride aerosol particles with the sizes of 0.3 micrometer can be higher than 90%. Besides, the method for manufacturing the filtering material for the mask is simple, cost is low, and the filtering material and the method are applicable to industrial production. |
priorityDate | 2012-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.