| abstract |
The present invention provides a method of forming a pattern to ensure excellent sensitivity, limit resolving power, roughness characteristics, exposure latitude (EL), post-exposure bake (PEB) temperature dependence, and focus latitude (depth of focus DOF) And a resist composition for use in said method. The method includes (A) forming a film from a resist composition including a resin containing a repeating unit containing a group that decomposes when subjected to an acid to thereby generate an alcoholic hydroxyl group, the resin thereby forming a reducing its solubility in a developer containing an organic solvent when subjected to an acid; (B) exposing the film; and (C) developing the exposed film using a developer containing an organic solvent. |