| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F112-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F112-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F112-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2011-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_986c7afb2116770433e5c3a225913a54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d15348ba694d559b9898c7d0043b3f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7518351acb0c62a1309306e980a222d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c176f1fdce4113014561a5a266f36da |
| publicationDate |
2015-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-102834774-B |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method |
| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method are provided. |
| priorityDate |
2010-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |